Tong Hua-yuan Fu Jiao Ya - Guo Chan-pu

Anyone else using local negative resists? Curious about your develop times (we used 2.38% TMAH, 60s).

Batch-to-batch consistency is the main issue. I recommend qualifying each new bottle with a short process matrix. guo chan-pu tong hua-yuan fu jiao ya

Here is a draft post suitable for a technical forum (e.g., Reddit r/chipdesign, LinkedIn, or a semiconductor engineering group): Working with Domestic Standard Negative Photoresist (e.g., RZJ-3040 / Ordinary Garden Type) Anyone else using local negative resists